Editing Nanowire (section)

=== Crack-Defined Shadow Mask Lithography ===

[[Optical lithography]] is a simple method to produce nanowires .<ref name="Enrico 2019 8217–8226">{{cite journal | author = Enrico|display-authors=etal| title = Scalable Manufacturing of Single Nanowire Devices Using Crack-Defined Shadow Mask Lithography | doi=10.1021/acsami.8b19410 | journal = ACS Appl. Mater. Interfaces| volume = 11 | pages = 8217–8226 | year = 2019 |issue=8|pmid=30698940|pmc=6426283| doi-access = free }}</ref> In this approach, optical lithography is used to generate nanogaps using controlled crack formation.<ref>{{cite journal | author = Dubois|display-authors=etal| title = Crack-Defined Electronic Nanogaps | doi=10.1002/adma.201504569 | journal = Advanced Materials | volume = 28 | pages = 2172178–2182 | year = 2016 |issue=11|pmid=26784270|bibcode=2016AdM....28.2178D |s2cid=205265220 |url=http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-182341}}</ref> These nanogaps are then used as shadow mask for generating individual nanowires with precise lengths and widths. This technique allows to produce individual nanowires below 20&nbsp;nm in width in a scalable way out of several metallic and metal oxide materials.