Jump to content
Main menu
Main menu
move to sidebar
hide
Navigation
Main page
Recent changes
Random page
Help about MediaWiki
Special pages
Niidae Wiki
Search
Search
Appearance
Create account
Log in
Personal tools
Create account
Log in
Pages for logged out editors
learn more
Contributions
Talk
Editing
STMicroelectronics
(section)
Page
Discussion
English
Read
Edit
View history
Tools
Tools
move to sidebar
hide
Actions
Read
Edit
View history
General
What links here
Related changes
Page information
Appearance
move to sidebar
hide
Warning:
You are not logged in. Your IP address will be publicly visible if you make any edits. If you
log in
or
create an account
, your edits will be attributed to your username, along with other benefits.
Anti-spam check. Do
not
fill this in!
===Grenoble, France=== [[Grenoble]] is one of the company's most important R&D centres, employing around 4,000 staff. The Polygone site employs 2,200 staff and is one of the historical bases of the company (ex SGS). All the historical wafer [[Fab (semiconductors)|fab]] lines are now closed but the site hosts the headquarters of many divisions (marketing, design, industrialization) and a R&D centre, focused on silicon and software design and fab process development.<ref>{{cite web|access-date=2023-11-03 |date=2013-07-24 |title=STMicroelectronics celebrates "Nano2017" R&D program at Crolles facility |publisher=powersystemsdesign.com |url=https://www.powersystemsdesign.com/articles/d-program-at-crolles-facility/36/702}}</ref> The [[Crolles]] site hosts a {{convert|200|mm|in|0|abbr=on}} and a {{convert|300|mm|in|abbr=on}} fab and was originally built as a common R&D centre for submicrometre technologies as part of the 1990 ''Grenoble 92'' partnership between SGS-Thomson and [[Centre national d'études des télécommunications|CNET]], the R&D center of French telecom company '''France Telecom'''.<ref>{{cite web|access-date=2023-11-03 |date= |title=The Controversy over Offshoring: Power, Resistance and Translations in the French Semiconductor Industry |publisher=strategie-aims.com |url=https://www.strategie-aims.com/conferences/23-xxiieme-conference-de-l-aims/communications/2894-the-controversy-over-offshoring-power-resistance-and-translations-in-the-french-semiconductor-industry/download}}</ref> The {{convert|300|mm|in|abbr=on}} fab was inaugurated by French president [[Jacques Chirac]], on 27 February 2003. It includes an R&D centre which focuses on developing new nanometric technology processes for 90-nm to 32-nm scale using {{convert|300|mm|in|abbr=on}} wafers and it was developed for ''The Crolles 2 Alliance''. This alliance of STMicroelectronics, [[TSMC]], [[NXP Semiconductors]] (formerly [[Philips]] semiconductor) and [[Freescale]] (formerly [[Motorola]] semiconductor) partnered in 2002 to develop the facility and to work together on process development.<ref>{{cite web|access-date=2023-11-03 |date= |title=Crolles2 Alliance Facility Expansion, Crolles |publisher=semiconductor-technology.com |url=https://www.semiconductor-technology.com/projects/crolles/}}</ref> The technologies developed at the facility were also used by global semiconductor [[foundry]] [[TSMC]] of Taiwan, allowing TSMC to build the products developed in Crolles on behalf of the Alliance partners who required such foundry capacity.
Summary:
Please note that all contributions to Niidae Wiki may be edited, altered, or removed by other contributors. If you do not want your writing to be edited mercilessly, then do not submit it here.
You are also promising us that you wrote this yourself, or copied it from a public domain or similar free resource (see
Encyclopedia:Copyrights
for details).
Do not submit copyrighted work without permission!
Cancel
Editing help
(opens in new window)
Search
Search
Editing
STMicroelectronics
(section)
Add topic