Editing Chemical vapor deposition (section)

== Uses ==
CVD is commonly used to deposit conformal films and augment substrate surfaces in ways  that more traditional surface modification techniques are not capable of. CVD is extremely useful in the process of [[atomic layer deposition]] at depositing extremely thin layers of material. A variety of applications for such films exist.  [[Gallium arsenide]] is used in some [[integrated circuit]]s (ICs) and  photovoltaic devices. Amorphous polysilicon is used in photovoltaic devices.  Certain [[carbide]]s and [[nitride]]s confer wear-resistance.<ref>Wahl, Georg ''et al.'' (2000) "Thin Films" in ''Ullmann's Encyclopedia of Industrial Chemistry'', Wiley-VCH, Weinheim. {{doi|10.1002/14356007.a26_681}}</ref> Polymerization by CVD, perhaps the most versatile of all applications, allows for super-thin coatings which possess some very desirable qualities, such as lubricity, hydrophobicity and weather-resistance to name a few.<ref>{{cite journal|last=Gleason|first=Karen|author2=Ayse Asatekin |author3=Miles C. Barr |author4=Samaan H. Baxamusa |author5=Kenneth K.S. Lau |author6=Wyatt Tenhaeff |author7=Jingjing Xu |title=Designing polymer surfaces via vapor deposition|journal=Materials Today|date=May 2010|volume=13|issue=5|pages=26–33|doi=10.1016/S1369-7021(10)70081-X|doi-access=free|hdl=1721.1/88187|hdl-access=free}}</ref> The CVD of [[metal-organic framework]]s, a class of crystalline nanoporous materials, has recently been demonstrated.<ref>{{cite journal
 |last1=Stassen |first1=I
 |last2=Styles  |first2=M
 |last3=Grenci  |first3=G
 |last4=Van Gorp  |first4=H
 |last5=Vanderlinden  |first5=W
 |last6=De Feyter  |first6=S
 |last7=Falcaro  |first7=P
 |last8=De Vos  |first8=D
 |last9=Vereecken  |first9=P
 |last10=Ameloot  |first10=R
 |year=2015
 |title=Chemical vapour deposition of zeolitic imidazolate framework thin films
 |journal=[[Nature Materials]]
 |volume=15
 |issue=3
 |pages=304–10
 |doi=10.1038/nmat4509
|pmid=26657328
 |bibcode=2016NatMa..15..304S|url=https://lirias.kuleuven.be/handle/123456789/551545
 }}</ref> Recently scaled up as an integrated cleanroom process depositing large-area substrates,<ref>{{cite journal
|last1=Cruz|first1=A. |last2=Stassen|first2=I. |last3=Krishtab|first3=M. |last4=Marcoen|first4=K. |last5=Stassin|first5=T. |last6=Rodríguez-Hermida|first6=S. |last7=Teyssandier|first7=J. |last8=Pletincx|first8=S. |last9=Verbeke|first9=R. |last10=Rubio-Giménez|first10=V. |last11=Tatay|first11=S. |last12=Martí-Gastaldo|first12=C. |last13=Meersschaut|first13=J. |last14=Vereecken|first14=P. M. |last15=De Feyter|first15=S. |last16=Hauffman|first16=T. |last17=Ameloot|first17=R.
 |year=2019
 |title=Integrated Cleanroom Process for the Vapor-Phase Deposition of Large-Area Zeolitic Imidazolate Framework Thin Films
 |journal=[[Chemistry of Materials]]
 |volume=31
 |issue=22
 |pages=9462–9471
 |doi=10.1021/acs.chemmater.9b03435
 |hdl=10550/74201
 |s2cid=208737085 |url=https://bib-pubdb1.desy.de/record/426613 |hdl-access=free
 }}</ref> the applications for these films are anticipated in gas sensing and [[low-κ dielectric]]s. CVD techniques are advantageous for membrane coatings as well, such as those in desalination or water treatment, as these coatings can be sufficiently uniform (conformal) and thin that they do not clog membrane pores.<ref name="Servi Guillen-Burrieza Warsinger Livernois 2017 pp. 470–479">{{cite journal | last1=Servi | first1=Amelia T. | last2=Guillen-Burrieza | first2=Elena | last3=Warsinger | first3=David M. | last4=Livernois | first4=William | last5=Notarangelo | first5=Katie | last6=Kharraz | first6=Jehad | last7=Lienhard V | first7=John H. | last8=Arafat | first8=Hassan A. | last9=Gleason | first9=Karen K. | title=The effects of iCVD film thickness and conformality on the permeability and wetting of MD membranes | journal=Journal of Membrane Science | volume=523 | year=2017 | issn=0376-7388 | doi=10.1016/j.memsci.2016.10.008 | pages=470–479| hdl=1721.1/108260 | s2cid=4225384 | url=http://dspace.mit.edu/bitstream/1721.1/108260/1/The%20effects%20of%20iCVD%20film%20thickness%20and%20conformality%20on%20the%20permeability%20and%20wetting%20of%20MD%20membranes%2c%20Servi%2c%20Dspace.pdf |archive-url=https://web.archive.org/web/20180723165544/http://dspace.mit.edu/bitstream/1721.1/108260/1/The%20effects%20of%20iCVD%20film%20thickness%20and%20conformality%20on%20the%20permeability%20and%20wetting%20of%20MD%20membranes%2c%20Servi%2c%20Dspace.pdf |archive-date=2018-07-23 |url-status=live | hdl-access=free }}</ref>